Nanolithography and microlithography devices and method of manufacturing such devices
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United States of America Patent
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Aug 19, 2008
Grant Date -
Sep 14, 2006
app pub date -
Mar 10, 2005
filing date -
Mar 10, 2005
priority date (Note) -
Expired
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Abstract
A lithography device includes one or more conductive strips monolithically embedded within an insulative structure. A method of manufacturing a lithography device includes monolithically forming a conductive strip through an insulative structure. Monolithically forming such a device includes forming the conductive strip on an mixed conductive-insulative layer, and embedding the conductive-insulative layer layer within the insulative structure. Such a device may readily be manufactured, is reliable, and is capable of various lithography applications and other applications requiring sub-micron and nano-scale electrode devices and electrode arrays.
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