Compositions and methods for image development of conventional chemically amplified photoresists
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United States of America Patent
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Aug 12, 2008
Grant Date -
Aug 3, 2006
app pub date -
Jan 28, 2005
filing date -
Jan 28, 2005
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Abstract
Methods for carrying out lithography with a carbon dioxide development system are described. In some embodiments the methods involve preferential removal of a darkfield region; in other embodiments the methds involve preferential removal of a light field region. The carbon dioxide development systems include a quaternary ammonium salt, preferably a quaternary ammonium hydroxide, halide, or carbonate. Compositions for carrying out the methods are also described. The quaternary ammonium salts preferably contain at least one CO.sub.2-philic group, such as a siloxane-containing group or a fluorine-containing group.
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