Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7410592
APP PUB NO 20010027570A1
SERIAL NO

09759179

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The stamp (10) for a lithographic process, such as patterning a surface layer, of the invention has a stamp body (5) with at least a first recess (11) formed therein, which recess defines a first aperture (15) in the printing face (3) of the stamp (10). The first recess (11) narrows with increasing distance to the printing face, while any cross-section of the first recess, when perpendicularly projected on the printing face (3), will lie within the aperture (15). The printing face may comprise small (11, 12) and large apertures (13) as well as small surfaces (14) in between apertures, while it is nevertheless able to produce prints which are accurate replicas of the printing face. Even details on a submicron scale can be adequately printed. The stamp (10) can be manufactured by a method which comprises anisotropic etching of a first body to make a mold and replicating the mold in the printing face (3) of the stamp (10).

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Patent Owner(s)

Patent OwnerAddress
U S PHILIPS CORPORATION1251 AVENUE OF THE AMERICAS NEW YORK NY 10020

International Classification(s)

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  • 2001 Application Filing Year
  • H01L Class
  • 12651 Applications Filed
  • 6832 Patents Issued To-Date
  • 54.01 % Issued To-Date

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blees, Martin Hillebrand Eindhoven, NL 11 119

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  • 17 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges741460848475278170928147343412001 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +01002003004005006007008009001000110012001300140015001600

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