Large area plasma source

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7400096
SERIAL NO

10894225

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An all permanent magnet Electron Cyclotron Resonance, large diameter (e.g., 40 cm) plasma source suitable for ion/plasma processing or electric propulsion, is capable of producing uniform ion current densities at its exit plane at very low power (e.g., below 200 W), and is electrodeless to avoid sputtering or contamination issues. Microwave input power is efficiently coupled with an ionizing gas without using a dielectric microwave window and without developing a throat plasma by providing a ferromagnetic cylindrical chamber wall with a conical end narrowing to an axial entrance hole for microwaves supplied on-axis from an open-ended waveguide. Permanent magnet rings are attached inside the wall with alternating polarities against the wall. An entrance magnet ring surrounding the entrance hole has a ferromagnetic pole piece that extends into the chamber from the entrance hole to a continuing second face that extends radially across an inner pole of the entrance magnet ring.

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Patent Owner(s)

Patent OwnerAddress
US GOVERNMENT ADMINISTRATOR OF NASA300 E STREET SW WASHINGTON DC 20546-0001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Foster, John Strongsville, OH 67 2010
Patterson, Michael Brunswick, OH 36 319

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