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Abstract

A pretreatment composition of: (a) at least one compound having structure VI V.sup.1--Y--V.sup.2VI wherein Y is selected from the group consisting of S, O, NR.sup.2, (HOCH).sub.p, and ##STR00001## each R.sup.1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R.sup.2 is independently H, SH, CH.sub.3, C.sub.2H.sub.5, and a linear or branched C.sub.1-C.sub.4 alkyl group containing a thiol group; and wherein V.sup.1 and V.sup.2 are independently selected from ##STR00002## wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y.dbd. ##STR00003## n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R.sup.1 is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.

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