RF ground switch for plasma processing system
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United States of America Patent
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Jul 1, 2008
Grant Date -
Mar 30, 2006
app pub date -
Sep 29, 2004
filing date -
Sep 29, 2004
priority date (Note) -
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status (Latency Note)
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Abstract
An arrangement in a plasma processing system for selectively providing an RF grounding path between an electrode and ground. The arrangement includes an RF conduction path structure and an annular structure. The annular structure and the RF conduction path structure having two relative positions relative to one another. A first relative position of the two relative positions is characterized by the annular structure electrically coupling with the RF conduction path structure to provide a ground to the RF conduction path structure. A second relative position of the two relative positions is characterized by the annular structure being electrically uncoupled from the RF conduction path.
First Claim
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