Alignment tool for precise pattern transfer
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United States of America Patent
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Jun 3, 2008
Grant Date -
Jun 22, 2006
app pub date -
Dec 21, 2004
filing date -
Dec 21, 2004
priority date (Note) -
Expired
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Abstract
Multi-point confocal microscopy, bright field microscope imaging, computer-controlled positioning stages, and an algorithm for automated leveling are the basis for a powerful but simple tool for aligning stamps used in precise pattern transfer to substrates. The system is relatively inexpensive and brings a capability similar to that of a photolithographic mask aligner to the world of elastomeric-stamp-based lithography. Alignment of the stamp and substrate is possible without contact between the two before printing.
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