Metallized film, method for the production thereof, and use thereof
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United States of America Patent
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May 20, 2008
Grant Date -
Jun 30, 2005
app pub date -
Feb 22, 2005
filing date -
Oct 9, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A vapor-deposited metallized film is disclosed including a metallized film that is vapor-deposited across the entire surface, and a metallized film that has been coated a number of times and also a method for producing a vapor-deposited metallized film, a metallized film that is vapor-deposited across the entire surface, and a metallized film that has been coated a number of times, wherein either a structure is printed onto a substrate or onto a supporting film with a soluble ink or the base materials are directly cleaned in a vacuum by means of plasma processing and are simultaneously initiated with target atoms, and wherein a metal or the like is vapor-deposited thereon followed by a production of the structured layer, for multiple uses, for example, in securities, as a radio frequency antenna for transponders and the like.
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