Extreme ultraviolet light source
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United States of America Patent
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May 6, 2008
Grant Date -
Oct 20, 2005
app pub date -
Apr 14, 2005
filing date -
Oct 16, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
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