Photopolymerizable composition
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United States of America Patent
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May 6, 2008
Grant Date -
Jul 28, 2005
app pub date -
Apr 3, 2003
filing date -
Apr 8, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond.The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.
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