Optical device and method of manufacture
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United States of America Patent
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Apr 15, 2008
Grant Date -
Dec 9, 2004
app pub date -
Jul 16, 2002
filing date -
Jul 17, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides for a method of producing an optical device by means of electron beam lithography and including the step of varying the characteristics of the electron beam spot during formation of the device and also an apparatus for producing diffractive optical devices and/or holographic devices by means of electron beam lithography and including an electron beam lithograph, controlling and processing means, means for varying the characteristics of the electron beam spot during formation of the device, and wherein the processing means is arranged for compiling and pre-processing data and for providing optimization and allocation control and to optical devices such as those produced thereby.
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