X-ray fluorescence spectrometer
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United States of America Patent
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Apr 8, 2008
Grant Date -
Mar 15, 2007
app pub date -
Sep 13, 2006
filing date -
Sep 14, 2005
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Abstract
An X-ray fluorescence spectrometer includes an X-ray source 7 for irradiating a sample 1 at a predetermined incident angle o with primary X-rays 6, and a detecting device 9 for measuring an intensity of fluorescent X-rays 8 generated from the sample at a predetermined detection angle .alpha. and .beta., wherein with two combinations of the incident angle o and the detection angle .alpha. and .beta., in which combinations the incident angles o and/or the detection angles .alpha. and .beta. are different from each other, each intensity of the fluorescent X-rays 8 is measured and, also, the incident angle o and the detection angle .alpha. and .beta. in each of the combination are so set that with respect to a measurement depth represented by the coating weight, at which the intensity of the fluorescent X-rays 8 attains a value equal to 99% of the uppermost limit when the coating weight of a target coating to be measured is increased, respective measurement depths in the two combinations may be a value greater than the coating weight of a coating 3.
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