Photosensitive resin based on saponified polyvinyl acetate photosensitive resin composition, method of forming aqueous gel from the same, and compound

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United States of America Patent

PATENT NO 7348128
APP PUB NO 20060148925A1
SERIAL NO

10538690

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Abstract

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A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound.The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1): ##STR00001## (wherein R.sub.1 represents H or Me; R.sub.2 represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X represents ##STR00002## m is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).

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Patent Owner(s)

Patent OwnerAddress
TOYO GOSEI CO LTD1603 KAMIMYODEN ICHIKAWA-SHI CHIBA 2720012

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyazaki, Mitsuharu Inba-gun, JP 4 19
Takano, Masahiro Inba-gun, JP 18 464
Utsunomiya, Shin Miyako, JP 9 48
Yamada, Seigo Ichikawa, JP 4 20

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