Apparatuses and methods for nondestructive microwave measurement of dry and wet film thickness

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United States of America Patent

PATENT NO 7339382
SERIAL NO

11271461

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Wet and dry film thickness can be measured non-invasively on structures, such as surfaces associated with vessels, aircraft and buildings, using calibrated microwave sensors. The film is measured by directing microwave energy toward the film. The microwave energy passes through the film and is reflected by a reflective or semi-reflective substrate surface below the film. Properties of the reflected wave are compared with properties of reflected waves that were passed through calibration samples of known thicknesses to determine the unknown thickness of the film. In some embodiments, one or more sensors are maintained at a fixed altitude above the conductive/semi-conductive substrate for measurement, and in other embodiments, one or more sensors are maintained at a fixed altitude above the film. In one embodiment, sensors are associated with a coating applicator, with a first sensor preceding the applicator and a second sensor following the applicator to measure the thickness of the film applied by the applicator by comparing measurements before and after coating.

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Patent Owner(s)

Patent OwnerAddress
SYSTEMS & MATERIALS RESEARCH CORPORATION1300 W KOENIG LANE SUITE 230 AUSTIN TX 78756

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bray, Alan V Spicewood, TX 15 738
Corley, Christian J Austin, TX 2 17
Garrett, Claude H Austin, TX 2 17

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