Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates
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United States of America Patent
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Feb 19, 2008
Grant Date -
Jan 8, 2004
app pub date -
Mar 3, 2003
filing date -
Sep 1, 2000
priority date (Note) -
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Abstract
A device for depositing crystalline layers onto one or more substrates in a process chamber, including: a reverse-heatable support plate which forms a wall of the process chamber and which is heated with a high frequency and is formed of inertly coated graphite; a gas inlet mechanism which is located in the center of the process chamber having a cover plate that is situated at a distance from the support plate; and a gas outlet ring formed of solid graphite which forms the outer limit of the process chamber and which has a plurality of radial gas outlets.
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