Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
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United States of America Patent
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Feb 12, 2008
Grant Date -
Dec 11, 2003
app pub date -
Apr 10, 2003
filing date -
Apr 11, 2002
priority date (Note) -
Expired
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Abstract
In a formation method for forming a fine structure in a workpiece containing an etching control component, using an isotropic etching process, a mask having an opening is applied to the workpiece, and the workpiece is etched with an etching solution to thereby form a recess, corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
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