Patterned atomic layer epitaxy
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United States of America Patent
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Feb 5, 2008
Grant Date -
Oct 13, 2005
app pub date -
Mar 25, 2005
filing date -
Mar 26, 2004
priority date (Note) -
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Abstract
A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.
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