Polarized radiation in lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7312852
APP PUB NO 20060139611A1
SERIAL NO

11022938

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Abstract

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A lithographic apparatus uses polarized light to improve the imaging properties, such as exposure latitude, while maintaining and extending the lifetime of an illumination system in the lithographic apparatus.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH
CARL ZEIS SMT AGCARL-ZEISS-STRASSE 22 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Boeij Wilhelmus Petrus Veldhoven, NL 24 542
Fiolka, Damian Oberkochen, DE 116 2064
Heil, Tilmann Aalen, DE 6 184
Wagner, Christian Eersel, NL 99 1092

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