Multilayer photoresist system
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United States of America Patent
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Dec 11, 2007
Grant Date -
Dec 30, 2004
app pub date -
Nov 20, 2003
filing date -
Nov 20, 2002
priority date (Note) -
Expired
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Abstract
Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
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