Imaging device in a projection exposure facility
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United States of America Patent
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-
Dec 4, 2007
Grant Date -
Dec 30, 2004
app pub date -
Dec 17, 2002
filing date -
Dec 19, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
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