Method of manufacturing electric device

United States of America Patent

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Dec 4, 2007
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Oct 7, 2004
filing date
Oct 7, 2004

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Abstract

In a method of manufacturing an electric device, moisture in a film substrate is reduced by heating the film substrate at a temperature in the range of 80.degree. C. to 100.degree. C. Thereafter, an IC is mounted on the film substrate.

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Patent Owner(s)

Patent Owner	Address
SEIKO INSTRUMENTS INC	8 NAKASE 1-CHOME MIHAMA-KU CHIBA-SHI CHIBA 261-8507
TORAY ADVANCED FILM CO LTD	3-16 NIHONBASHI HONGOKU-CHO 3-CHOME CHUO-KU TOKYO 1030021 ?1030021
MARUWA CORPORATION	8-1 AZA IWAI SANBONGI OTONASHI OSAKI-SHI MIYAGI 989-6313

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Adachi, Hideaki	Chiba, JP	93	861
Hayashi, Keiichiro	Chiba, JP	21	275
Koizumi, Nobukazu	Fujisawa, JP	54	782
Matsuhira, Tsutomu	Chiba, JP	26	656
Nishigawa, Tadahiro	Fukushima, JP	3	5

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Method of manufacturing electric device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

10960168

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US Family Size	Non-US Coverage
Patent Longevity Expired	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
December 04, 2007	US,7303943,B2 US7303943B2	GRANTED PATENT AS SECOND PUBLICATION
April 13, 2006	US,20060079026,A1 US20060079026A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	7303943
SERIAL NO	10960168
DOCKET NO

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10960168

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