Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes and nanotubes thus obtained
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United States of America Patent
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Dec 4, 2007
Grant Date -
Jan 22, 2004
app pub date -
Oct 26, 2001
filing date -
Oct 27, 2000
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Abstract
Electron cyclotron resonance plasma deposition process and device for single-wall carbon nanotubes (SWNTs) on a catalyst-free substrate, by injection of microwave power into a deposition chamber comprising a magnetic confinement structure with a magnetic mirror, and at least one electron cyclotron resonance area inside or at the border of the deposition chamber and facing the substrate, whereby dissociation and/or ionization of a gas containing carbon is caused, at a pressure of less than 10.sup.-3 mbars, in the magnetic mirror at the center of the deposition chamber, producing species that will be deposited on said heated substrate. The substrate surface includes raised and/or lowered reliefs. The invention concerns the SWNTs thus obtained.
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