Optical element with an optical axis
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United States of America Patent
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Nov 13, 2007
Grant Date -
Dec 23, 2004
app pub date -
Oct 18, 2002
filing date -
Oct 20, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2') in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2') is designed to apply a force in said extension (2, 2').
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