Composition sensitive to visible light

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7294448
APP PUB NO 20060003259A1
SERIAL NO

10523523

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Abstract

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The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): ##STR00001## wherein R.sup.1, R.sup.2, and R.sup.3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R.sup.1 and R.sup.2 form cycloalkyl together with the adjacent carbon atom, and R.sup.4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.

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Patent Owner(s)

Patent OwnerAddress
KYOWA HAKKO CHEMICAL CO LTDTOKYO 103-0022

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Katsuhiro Yokkaichi, JP 52 493
Iwasaki, Takeshi Ichihara, JP 189 1811
Shimizu, Ikuo Yokkaichi, JP 44 283
Yamaoka, Tsuguo Funabashi, JP 34 503

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