Alkylsilanes as solvents for low vapor pressure precursors
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United States of America Patent
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Nov 13, 2007
Grant Date -
Jun 14, 2007
app pub date -
Jul 10, 2006
filing date -
Dec 13, 2005
priority date (Note) -
Expired
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Abstract
Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at least one alkylsilane. In another embodiment, a method of removing at least one chemical precursor from a semiconductor fabrication system comprises forcing a solvent containing at least one alkylsilane through the semiconductor fabrication system and dissolving the at least one chemical precursor in the solvent. The solvent may also contain mixtures of different alkylsilanes and other organic solvents.
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