Method for the interferometric measurement of non-rotationally symmetric wavefront errors
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United States of America Patent
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Oct 2, 2007
Grant Date -
Mar 3, 2005
app pub date -
Sep 1, 2004
filing date -
Nov 25, 2000
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Abstract
The method serves for the interferometric measurement of non-rotationally symmetric wavefront errors on a specimen . The specimen is brought into a number of rotational positions, at least one measurement result being determined in each of the rotational positions and a mathematical evaluation of all measurement results is performed. The measurement results (M.sub.1 . . . M.sub.m; N.sub.1 . . . N.sub.n) of each of the measurement series (M, N) are determined respectively in mutually equidistant rotational positions of the specimen . The measurement results (M.sub.1 . . . M.sub.m, N.sub.1 . . . N.sub.n) of each of the at least two measurement series (M, N) are evaluated independently of one another for non-rotationally symmetric wavefront errors (
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