Exposure mask device and method for orienting a plurality of substrates on an exposure mask
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United States of America Patent
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Aug 21, 2007
Grant Date -
Jan 20, 2005
app pub date -
Aug 28, 2002
filing date -
Sep 12, 2001
priority date (Note) -
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Abstract
A method for registering a plurality of substrates that are retained on a workpiece carrier onto an exposure mask for carrying out a photolithography process has the steps of registering and immobilizing the exposure mask onto an alignment panel having precisely fitting passthrough orifices for reception of one substrate for each passthrough orifice and inserting into the passthrough orifices of the alignment panel the substrates that are retained on the workpiece carrier.
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