System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 10, 2007
Grant Date -
Dec 1, 2005
app pub date -
May 26, 2004
filing date -
May 26, 2004
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully