Processes for producing silane monomers and polymers and photoresist compositions comprising same
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United States of America Patent
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May 15, 2007
Grant Date -
Nov 27, 2003
app pub date -
Mar 3, 2003
filing date -
Mar 3, 2002
priority date (Note) -
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Abstract
The invention includes new Si-containing monomers, polymers containing such monomers and photoresists that contain the polymers. Synthetic methods of the invention include reacting a vinyl carbocyclic aryl ester compound with a reactive silane compound to provide the monomer.
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