System and method for detection of spatial signature yield loss

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United States of America Patent

PATENT NO 7211450
APP PUB NO 20060160254A1
SERIAL NO

11036672

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Abstract

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A method and system are provided for identifying systematic yield losses. The method comprising testing produced products using a test sequence, the testing sequence producing yield data, the yield data related to a wafer. For each zone of each wafer size calculating and storing a first data series R1, wherein each element of said first series is the yield of a said zone. Further calculating and storing for each element of R1 a second data series R2, wherein each element of the second series is a p consecutive element moving average of R1. Calculating and storing for each element of R1 a third data series R3 wherein each element of the third data series a p consecutive element moving standard deviation of data series R1. Calculating for each element of R1 a trigger point, wherein the trigger point is calculated as the respective R2 element less an adjusted respective R3 value. A notification is triggered when the trigger point calculated for each element of R1 is greater than the respective element of R1.

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Patent Owner(s)

Patent OwnerAddress
SYSTEMS ON SILICON MANUFACTURING CO PTE LTD70 PASIR RIS INDUSTRIAL DRIVE 1 SINGAPORE 519527

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ho, Eng Keong Singapore, SG 4 0

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