Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7199858
SERIAL NO

10705804

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Abstract

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A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bijlaart, Erik Theodorus Maria Rosmalen, NL 28 1779
Butler, Hans Best, NL 166 2708
De, Smit Joannes Theodoor Eindhoven, NL 50 5946
Donders, Sjoerd Nicolaas Lambertus 's-Hertogenbosch, NL 253 8312
Hoogendam, Christiaan Alexander Veldhoven, NL 205 9950
Kolesnychenko, Aleksey Yurievich Helmond, NL 68 2643
Lof, Joeri Eindhoven, NL 94 8170
Loopstra, Erik Roelof Heeze, NL 325 13468
Meijer, Hendricus Johannes Maria Veldhoven, NL 45 2812
Mertens, Jeroen Johannes Sophia Maria Duizel, NL 160 6273
Mulkens, Johannes Catharinus Hubertus Maastricht, NL 213 10886
Ritsema, Roelof Aeilko Siebrand Eindhoven, NL 37 4991
Sengers, Timotheus Franciscus 's-Hertogenbosch, NL 61 3237
Simon, Klaus Eindhoven, NL 89 7360
Straaijer, Alexander Eindhoven, NL 87 8017
Streefkerk, Bob Tilburg, NL 201 10575
Van, Santen Helmar Amsterdam, NL 101 4784
Van, Schaik Frank Eindhoven, NL 22 882

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