Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus
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United States of America Patent
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Mar 13, 2007
Grant Date -
Oct 13, 2005
app pub date -
May 21, 2003
filing date -
Jun 5, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. While compressed air is sprayed toward the contaminant, the contaminant removed by the spray of the compressed air is exhausted outside a system of a deposition chamber by suction and exhausting device so that the contaminant is not transferred to sides of the deposition chamber and a plastic container in which a CVD film is formed, in a process for extracting the source gas introduction pipe from the plastic container after the CVD film is formed on an inner surface of the plastic container.
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