Advanced illumination system for use in microlithography
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United States of America Patent
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Mar 6, 2007
Issued Date -
N/A
app pub date -
Jul 22, 2004
filing date -
Jun 11, 2002
priority date (Note) -
In Force
status (Latency Note)
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Abstract
A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
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International Classification(s)
Cited Art Landscape
Patent Citation Ranking
- 5 Citation Count
- G03B Class
- 5.09 % this patent is cited more than
- 18 Age
