Rotating sputtering magnetron

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 7182843
APP PUB NO 20050103619A1
SERIAL NO

10982616

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The magnet arrangement and resulting rotating sputtering magnetron design of an embodiment provides magnetic flux density and distribution to penetrate thick production ferrous targets. Further, the magnetic field shape improves target life by more uniformly removing target material.

First Claim

See full text

Other Claims data not available

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
DEXTER MAGNETIC TECHNOLOGIES INC1050 MORSE AVENUE ELK GROVE VILLAGE IL 60007

International Classification(s)

loading....
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2004200520062007200820092010201120122013201420152016201720180255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Li, Chun Plainview, NY 158 1857
Padua, Christopher Campbell, CA 1 6
Stelter, Richard Buford, GA 2 7
Welk, Aron Tracy, CA 4 8

Cited Art Landscape

Load Citation

Patent Citation Ranking

  • 3 Citation Count
  • C23C Class
  • 3.52 % this patent is cited more than
  • 18 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges182381025732191810443701 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +020406080100120140160180200220240260

Forward Cite Landscape

Load Citation