Method of developing a resist film and a resist development processor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Feb 20, 2007
Issued Date -
N/A
app pub date -
Feb 23, 2006
filing date -
Nov 19, 2002
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully