Method of and apparatus for determining the amount of impurity in gas

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United States of America Patent

PATENT NO 7176464
APP PUB NO 20060011844A1
SERIAL NO

11181777

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Impurity is removed from gas, the resultant gas is introduced into a cell 15, and the intensity of light transmitted through the cell 15 is measured as a reference. Gas containing impurity of which concentration is known, is introduced into the cell 15, and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurement of the reference light intensity. Then, the absorbance of the impurity is obtained according to the ratio of the two light intensity data obtained by the two measurements above-mentioned. The impurity absorbance thus obtained is stored, in a memory 20a, as a function of an impurity concentration. Gas containing impurity of which concentration is unknown, is introduced into the cell 15, and the intensity of light transmitted through the cell 15 is measured with the temperature and pressure maintained at those used at the measurements above-mentioned. The absorbance of the impurity is obtained according to the last-measured light intensity and the reference light intensity. The absorbance thus obtained is applied to the function, thereby to obtain the impurity concentration.

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Patent Owner(s)

Patent OwnerAddress
OTSUKA ELECTRONICS CO LTDJAPAN'S OSAKA TIAN RECRUIT MENTION HIRAKATA LAST THREE 26 TIMES 3 CHOME HIRAKATA-SHI OSAKA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nitta, Satoshi Kameoka, JP 12 39
Oka, Koichi Otsu, JP 25 191

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