Photopolymer composition suitable for lithographic printing plates
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United States of America Patent
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Jan 30, 2007
Grant Date -
Apr 13, 2006
app pub date -
Nov 28, 2003
filing date -
Nov 28, 2002
priority date (Note) -
Expired
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Abstract
Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.
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