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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
INFINEON TECHNOLOGIES AG	GERMAN LAURA KAN ANG 1-12 PYRENE EBY BERG CITY NO NEUBIBERG BAVARIA

International Classification(s)

• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Dammel, Ralph	Flemington, NJ	33	347
Hohle, Christoph	Bubenreuth, DE	18	265
Houlihan, Michael Francis	Millington, NJ	1	2

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 30, 2007	US,7169531,B2   US7169531B2	GRANTED PATENT AS SECOND PUBLICATION
August 04, 2005	US,20050170279,A1   US20050170279A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 7169531

Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives

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