Laser CVD device and laser CVD method
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United States of America Patent
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Jan 23, 2007
Grant Date -
Jan 22, 2004
app pub date -
Jun 20, 2003
filing date -
Jun 25, 2002
priority date (Note) -
Expired
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Abstract
A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating gas into a plasma state by arc discharge and for supplying the plasma sate gas to the film formation face; and a film forming unit having means for sealing film forming gas while being isolated from an external atmosphere, means for radiating a laser beam to the film forming gas, wherein the film is formed over the film formation face of the substrate.
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