Versatile maskless lithography system with multiple resolutions
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United States of America Patent
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Jan 16, 2007
Grant Date -
Jan 19, 2006
app pub date -
Jul 13, 2004
filing date -
Jul 13, 2004
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Abstract
A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.
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