Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems
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United States of America Patent
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Jan 9, 2007
Grant Date -
Feb 10, 2005
app pub date -
Jun 24, 2004
filing date -
Jun 25, 2003
priority date (Note) -
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Abstract
A plasma processing system includes a reactor, a top electrode made of a magnetic or ferromagnetic metal or a metal-alloy, wherein a RF or DC power is applied to generate plasma within the reactor; a gas showerhead fixed to the top electrode; a sheet-like magnetic assembly bound to the upper surface of the gas showerhead, which includes a plurality of separate magnets, a metal sheet made of a ferromagnetic metal, and a deformable film.
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