Method for making optical devices with a moving mask and optical devices made thereby
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United States of America Patent
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Jan 2, 2007
Grant Date -
Jan 2, 2003
app pub date -
Feb 21, 2002
filing date -
Feb 21, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a method for forming a vertical taper in a waveguide. In the present invention, a shadow mask is disposed above a waveguide requiring a vertical taper. Then, the waveguide is exposed to a directional etching process (e.g. deep reactive ion etching) while the mask is moved. Ask the mask moves, different regions of the waveguide will be etched different depths, resulting in a vertical taper in the waveguide.
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