Integrated process condition sensing wafer and data analysis system
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United States of America Patent
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Dec 19, 2006
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app pub date -
Nov 19, 2003
filing date -
Dec 3, 2002
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Abstract
A process condition measuring device and a handling system may be highly integrated with a production environment where the dimensions of the process condition measuring device are close to those of a production substrate and the handling system is similar to a substrate carrier used for production substrates. Process conditions may be measured with little disturbance to the production environment. Data may be transferred from a process condition measuring device to a user with little or no human intervention.
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