Method for correcting a mask design layout
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United States of America Patent
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Dec 12, 2006
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N/A
app pub date -
Feb 25, 2004
filing date -
Feb 25, 2003
priority date (Note) -
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Abstract
A method for performing a mask design layout resolution enhancement includes determining a level of correction for a mask design layout for a predetermined parametric yield with a minimum total correction cost. The mask design layout is corrected at a determined level of correction based on a correction algorithm if the correction is required. In this manner, only those printed features on the mask design layout that are critical for obtaining a desired performance yield are corrected, thereby reducing total cost of correction of the mask design layout.
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