Illumination system, particularly for EUV lithography
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United States of America Patent
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Dec 12, 2006
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N/A
app pub date -
Jan 6, 2004
filing date -
May 5, 1998
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Abstract
There is provided an illumination system. The illumination system includes a light source for emitting light having a wavelength .ltoreq.193 nm, an optical system, and a radiation protection wall situated between the light source and the optical system.
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