Beam guiding arrangement, imaging method, electron microscopy system and electron lithography system
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United States of America Patent
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Nov 14, 2006
Grant Date -
May 6, 2004
app pub date -
Aug 12, 2003
filing date -
Aug 13, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.
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