Method for producing multicrystalline silicon substrate for solar cells

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United States of America Patent

PATENT NO 7135414
SERIAL NO

11002657

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Abstract

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Disclosed is a method for producing a multicrystalline silicon substrate for solar cells comprising: a metal deposition step for depositing such metal particles as platinum and silver on the surface of the substrate by electroless-plating chloroplatinic acid or silver perchlorate; a boring step for subjecting the substrate surface to etching in a solution containing at least one of hydrofluoric acid and hydrogen peroxide; and a step for removing a stain layer by immersing the substrate into an alkaline solution. A multicrystalline silicon substrate having a lower reflectance is provided at a lower cost.

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Patent Owner(s)

Patent OwnerAddress
KANSAI TECHNOLOGY LICENSING ORGANIZATION CO LTD93 CHUDOJI AWATA-CHO SHIMOGYO-KU KYOTO-SHI KYOTO 600-8815

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsumura, Michio Toyonaka, JP 6 228
Tujino, Kazuya Toyonaka, JP 1 28

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