Evaporation method and apparatus thereof
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United States of America Patent
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Oct 24, 2006
Grant Date -
May 13, 2004
app pub date -
Oct 24, 2003
filing date -
Oct 25, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An evaporation method and an apparatus thereof are disclosed. The evaporation apparatus comprises a rotator, a heater and a source supplying device. The rotator, which is disposed above the central portion of the substrate, can rotate the substrate. An evaporation source is disposed on the heater, and the evaporation region is a circular region. The heater and the source supplying device are disposed below the substrate, wherein the source supplying device provides the evaporation source on the heater along a supply direction. In order to prevent the location of the evaporation source shifts along the supply direction from affecting the uniformity of deposited film, a circular trace is defined and the heater is disposed below the circular trace so that the supplying direction is parallel to the tangential direction of the circular trace.
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