Wet processing using a fluid meniscus, apparatus and method
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United States of America Patent
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Oct 17, 2006
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app pub date -
Sep 28, 2000
filing date -
Sep 28, 2000
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Abstract
A wet processing apparatus and method that takes advantage of a fluid meniscus to process at least a portion of a surface of an object. After one surface of the object has been processed another side or surface of the object can be similarly processed. This processing can be coating, etching, plating, to name a few. An application of the apparatus and method is in the semiconductor processing industry, especially, the processing of wafers and substrates. The method and apparatus also allows the processing of multiple surfaces of an electronic component.
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