Patterning method

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United States of America Patent

PATENT NO 7115507
APP PUB NO 20050176242A1
SERIAL NO

10623495

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Abstract

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A substrate is patterned by forming an indent region 8 in the surface 10 of a substrate 4 and depositing a liquid material onto the surface 10 at selected locations adjacent to the indent region 8. The liquid material spreads over the surface to an edge of the indent region, at which point further spreading is controlled by the effective enhancement of the contact angle of the liquid material relative to the surface as provided by the indent region.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATION1-6 SHINJUKU 4-CHOME SHINJUKU-KU TOKYO 160-8801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawase, Takeo Cambridge, GB 94 5280

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